Translational temperature measurement for SiH2 in RF silane plasma using CW laser induced fluorescence spectroscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 8, 1998, Pages 4588-4589

  Kono, Akihiro ^a   Hirose, Satoshi ^a   Kinoshita, Keizo ^b   Goto, Toshio ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Laser induced fluorescence; Radio frequency plasma; Ring dye laser; SiH2; SiH4; Silane plasma; Translational temperature

Indexed keywords

DYE LASERS; ELECTRIC EXCITATION; PLASMAS; SILANES; SUPERCONDUCTING TRANSITION TEMPERATURE;

LASER INDUCED FLUORESCENCE SPECTROSCOPY; SILANE PLASMAS;

FLUORESCENCE;

EID: 0032131693     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4588     Document Type: Article

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