Photocatalytic degradation rate of oxalic acid on the semiconductive layer of n-TiO2 particles in the batch mode plate reactor Part I: Mass transfer limits

Journal of Applied Electrochemistry

Volumn 28, Issue 8, 1998, Pages 843-853

  Kulas, J ^a   Rousar I ^a   Krysa J ^a   Jirkovsky J ^b  

^a INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

Author keywords

Mass transfer; n TiO2; Oxalic acid; Photocatalytic degradation

Indexed keywords

CARBOXYLIC ACIDS; CATALYSIS; DEGRADATION; MASS TRANSFER; SEMICONDUCTOR MATERIALS; TITANIUM DIOXIDE;

OXALIC ACID; PHOTOCATALYTIC DEGRADATION; SEMICONDUCTING TITANIUM COMPOUNDS;

PHOTOLYSIS;

EID: 0032131052     PISSN: 0021891X     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1003492510056     Document Type: Article

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