Sectional examination of thin films by atomic force microscopy

Electrochemical and Solid-State Letters

Volumn 1, Issue 1, 1998, Pages 24-26

  Echeverria, F ^a   Skeldon, P ^a   Thompson, G E ^a   Walton, J R ^a   Habazaki, H ^b   Shimizu, K ^c  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b TOHOKU UNIVERSITY   (Japan)

^c KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROSCOPIC EXAMINATION; OXIDES; THIN FILMS;

ANODIC FILMS;

ATOMIC FORCE MICROSCOPY;

EID: 0032124165     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390622     Document Type: Article

References (8)

1. T. J. Warner, M. P. Schmidt, F. Sommer, and D. Bellot, Z. Metallkd., 86, 494 (1995).
2. J. Y. Josefowicz, L. Xie, and G. C. Farrington, J. Phys. Chem., 97, 11995 (1993).
3. J. Y. Josefowicz, J. J. DeLuccia, V. S. Agarwala, and G. C. Farrington, Mater. Charact., 34, 73 (1995).
4. L. Chen and D. Guay, J. Electrochem. Soc., 141, L43 (1994).
5. R. M. Rynders, C.-H. Paik, R. Ke, and R. C. Alkire, J. Electrochem. Soc., 141, 1439 (1994).
6. K. Shimizu, K. Kobayashi, P. Skeldon, G. E. Thompson, and G. C. Wood, Corros. Sci., 39, 701 (1997).
7. R. C. Furneaux, G. E. Thompson, and G. C. Wood, Corros. Sci., 18, 853 (1978).
8. J. M. Poate, P. J. Silverman, and J. Yahalom, J. Phys. Chem. Solids, 34, 1847 (1973).