Incorporation of cadmium sulfide into nanoporous silicon by sequential chemical deposition from solution

Journal of the Electrochemical Society

Volumn 145, Issue 7, 1998, Pages 2448-2452

  Gros Jean, M ^a   Herino, R ^a,c   Lincot, D ^b,c  

^a UNIV GRENOBLE ALPES   (France)

^b CNRS   (France)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; FLUORESCENCE; MONOLAYERS; NANOSTRUCTURED MATERIALS; POROUS MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING CADMIUM COMPOUNDS; SULFUR COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CADMIUM SULFIDE; SEQUENTIAL CHEMICAL BATH DEPOSITION;

ELECTRIC CONTACTS;

EID: 0032123782     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838657     Document Type: Article

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