Behavior of radio frequency PACVD bilayers (SiC/TiN) on steel

Thin Solid Films

Volumn 324, Issue 1-2, 1998, Pages 141-150

  Andrieux, M ^a   Ducarroir, M ^a,c   Beauprez, E ^b  

^a UNIVERSITÉ DE PERPIGNAN   (France)

^b DCE/CREA/PS   (France)

^c CNRS   (France)

Author keywords

Adhesion; Plasma processing and deposition; Silicon carbide; Titanium nitride

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; INTERFACES (MATERIALS); PLASMA APPLICATIONS; SECONDARY ION MASS SPECTROMETRY; SILICON CARBIDE; STEEL; SUBSTRATES; TITANIUM NITRIDE;

COLD WALL REACTORS; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD);

PROTECTIVE COATINGS;

EID: 0032122980     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00360-5     Document Type: Article

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