The growth and phase transitions of epitaxial Pb(Zr0.95Ti0.05)O3 thin films prepared by sputter deposition combined with post-annealing on SrTiO3(100)

Journal of Crystal Growth

Volumn 191, Issue 1-2, 1998, Pages 113-118

  Lu, C J ^a,b   Shen, H M ^a   Wang, Y N ^a  

^a NANJING UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Antiferroelectric; Epitaxial growth; Phase transitions; Sputtering; Thin film

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; LEAD COMPOUNDS; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SPUTTER DEPOSITION; STOICHIOMETRY; STRONTIUM COMPOUNDS; THERMAL EFFECTS; THIN FILMS;

ANTIFERROELECTRICITY; CURIE POINT; ORTHORHOMBIC RHOMBOHEDRAL PHASE TRANSITION;

PEROVSKITE;

EID: 0032122827     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00119-5     Document Type: Article

References (24)

1. B. Jaffe, W.R. Cooke Jr., H. Jaffe, in: J.P. Roberts, P. Popper (Eds.), Piezoelectric Ceramics, Academic Press, London, 1971, pp. 135-181.
2. T. Tani, J.F. Li, D.D. Viehland, D.A. Payne, J. Appl. Phys. 75 (1994) 3017.
3. J.F. Li, D.D. Viehland, T. Tani, C.D.E. Lakeman, D.A. Payne, J. Appl. Phys. 75 (1994) 442.
4. K. Yamakawa, S. Trolier-Mckinstry, J.P. Dougherty, S.B. Krupanidhi, Appl. Phys. Lett. 67 (1995) 2014.
5. F.L. Wang, K.K. Li, E. Furman, G.H. Haertling, Opt. Lett. 18 (1993) 1615.
6. K.R. Udayakumar, Ph.D. thesis, The Pennsylvania State University, 1993.
7. S.S. Sengupta, D. Roberts, J.F. Li, M.C. Kim, D.A. Payne, J. Appl. Phys. 78 (1995) 1171.
8. Y. Akiyama, S. Kimura, I. Fujimura, Jpn. J. Appl. Phys. 32 (1993) 4154.
9. I. Kanno, S. Hayashi, M. Kitagawa, R. Takayama, T. Hirao, Appl. Phys. Lett. 66 (1995) 145.
10. J.F. Scott, Phase Transitions 30 (1991) 107.
11. Y. Sakashita, T. Ono, H. Segawa, K. Tominaga, M. Okada, J. Appl. Phys. 69 (1991) 8352.
12. K. Kushida, H. Takeuchi, IEEE Trans. Ultrasonics Ferroelectrics, Frequency Control 38 (1991) 656.
13. B.S. Kwak, A. Erbil, J.D. Budai, M.F. Chisholm, L.A. Boatner, B.J. Wilkens, Phys. Rev. B 49 (1994) 14865.
14. G.A. Rossetti, L.E. Cross, K. Kushida, Appl. Phys. Lett. 59 (1991) 2524.
15. J.S. Speck, A. Seifert, W. Pompe, R. Ramesh, J. Appl. Phys. 76 (1994) 477.
16. G.R. Bai, H.L.M. Chang, D.J. Lam, Appl. Phys. Lett. 62 (1993) 1754.
17. C.V.R. Vasant Kumar, R. Pascual, M. Sayer, J. Appl. Phys. 71 (1992) 864.
18. H. Tanaka, H. Tabata, T. Kawai, Y. Yamazaki, S. Oki, S. Gohda, Thin Solid Films 289 (1996) 29.
19. N.A. Basit, H.K. Kim, J. Vac. Sci. Technol. A 13 (1995) 2214.
20. H. Adahi, T. Mitsuyu, O. Yamazaki, K. Wasa, J. Appl. Phys. 60 (1986) 736.
21. D. Viehland, Phys. Rev. B 52 (1995) 778.
22. H. Fujishita, Y. Shiozaki, N. Achiwa, E. Sawaguchi, J. Phys. Soc. Japan 51 (1982) 3582.
23. M. Tanaka, R. Saito, K. Tsuzuki, Jpn. J. Appl. Phys. 21 (1982) 291.
24. C.J. Lu, H.M. Shen, Y.N. Wang, Appl. Phys. A 66 (1998) 445.