SCOPUS 정보 검색 플랫폼

Volumn 145, Issue 7, 1998, Pages 2558-2562

Chemical reactions in plasma-assisted chemical vapor deposition of titanium

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; MOLECULES; PLASMA ETCHING; REACTION KINETICS; THERMODYNAMICS;

MACROCAVITY ANALYSIS; TITANIUM TETRACHLORIDE;

TITANIUM;

EID: 0032122648 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1838679 Document Type: Article

Times cited : (8)

References (5)

1
- 0003088181
- R. Blumenthal and G. Janssen, Editors, MRS, Pittsburgh, PA
- M. S. Ameen, J. T. Hillman, J. Faguet, R. F. Foster, C. Arena, and F. Martin, in Advanced Metallization for ULSI Applications in 1994, R. Blumenthal and G. Janssen, Editors, p. 269, MRS, Pittsburgh, PA (1995).
- (1995) Advanced Metallization for ULSI Applications in 1994 , pp. 269
- Ameen, M.S.¹ Hillman, J.T.² Faguet, J.³ Foster, R.F.⁴ Arena, C.⁵ Martin, F.⁶

2
- 5244240969
- T. Akahori, T. Murakami, and Y. Morioka, in Proceedings of VLSI Multilevel Interconnection Conference VMIC '93, p. 405 (1993).
- (1993) Proceedings of VLSI Multilevel Interconnection Conference VMIC '93 , pp. 405
- Akahori, T.¹ Murakami, T.² Morioka, Y.³

3
- 0009437838
- L. Hong, K. Shimogaki, Y. Egashira, and H. Komiyama, J. Electrochem. Soc., 139, 67 (1992).
- (1992) J. Electrochem. Soc. , vol.139 , pp. 67
- Hong, L.¹ Shimogaki, K.² Egashira, Y.³ Komiyama, H.⁴

4
- 4243145510
- R. F. Lever, IBM J., 8, 460 (1964).
- (1964) IBM J. , vol.8 , pp. 460
- Lever, R.F.¹

5
- 0004230914
- National Bureau of Standards, Washington, DC
- JANAF Thermodynamical Tables, 2nd ed., D. R. Stull, Editor, National Bureau of Standards, Washington, DC (1971).
- (1971) JANAF Thermodynamical Tables, 2nd Ed.
- Stull, D.R.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.