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Volumn 54, Issue 1-3, 1998, Pages 67-70
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Annealing behavior of defects introduced in SOI structure by arsenic ion implantation (ESR and PAS studies)
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Author keywords
Amorphous; Electron spin resonance; Polycrystalline; Silicon on insulator
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Indexed keywords
AMORPHOUS MATERIALS;
ANNEALING;
ARSENIC;
CHEMICAL BONDS;
CRYSTAL DEFECTS;
ELECTRON SPIN RESONANCE SPECTROSCOPY;
ION IMPLANTATION;
PARAMAGNETISM;
PHOTOACOUSTIC SPECTROSCOPY;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTOR DEVICE STRUCTURES;
ARSENIC ION IMPLANTATION;
PARAMAGNETIC DEFECTS;
SILICON ON INSULATOR TECHNOLOGY;
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EID: 0032121389
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/S0254-0584(98)00017-0 Document Type: Article |
Times cited : (6)
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References (15)
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