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Volumn 54, Issue 1-3, 1998, Pages 67-70

Annealing behavior of defects introduced in SOI structure by arsenic ion implantation (ESR and PAS studies)

Author keywords

Amorphous; Electron spin resonance; Polycrystalline; Silicon on insulator

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; ARSENIC; CHEMICAL BONDS; CRYSTAL DEFECTS; ELECTRON SPIN RESONANCE SPECTROSCOPY; ION IMPLANTATION; PARAMAGNETISM; PHOTOACOUSTIC SPECTROSCOPY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0032121389     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(98)00017-0     Document Type: Article
Times cited : (6)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.