Beyond conversion factors: A new approach to MFC calibration

Semiconductor International

Volumn 21, Issue 8, 1998, Pages 243-250

  Dille, Joseph ^a,b  

^a Brooks Instrument   (United States)

^b Brooks Instrument Semiconductor Group   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY OF GASES; HELIUM; MOLECULAR STRUCTURE; NITROGEN; PRESSURE; REYNOLDS NUMBER; SEMICONDUCTOR DEVICE MANUFACTURE; SENSORS; SPECIFIC HEAT OF GASES; TEMPERATURE; THERMAL CONDUCTIVITY OF GASES; VISCOSITY OF GASES;

CHLORINATED FLUOROCARBON COMPOUND; MASS FLOW CONTROL; THERMAL MASS FLOW SENSOR;

CALIBRATION;

EID: 0032119864     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. SEMATECH, Mass Plow Control in a Semiconductor Process, 93021493A-TRG.
2. The data collected for Figures 2 and 3 were collected at Brooks Instrument.
3. Instrument ranges reported as nitrogen equivalent. Tests performed at Brooks Instrument.
4. 6. Data taken by W3 Corporation.
5. The data collected for Figure 5 were collected at Brooks Instrument.
6. Data taken by W3 Corporation. Instrument tested Brooks Instrument Model 6256 PureDigital Select.