Microhardness properties of Cu-W amorphous thin films

Journal of Materials Science

Volumn 33, Issue 13, 1998, Pages 3401-3405

  Radic N ^a   Stubicar M ^b  

^a RUDER BO KOVI INSTITUTE   (Croatia)

^b UNIVERSITY OF ZAGREB   (Croatia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; BINARY ALLOYS; COPPER; COPPER ALLOYS; CRYSTALLIZATION; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROHARDNESS; SPUTTER DEPOSITION; THIN FILMS; TUNGSTEN;

COPPER-TUNGSTEN ALLOY;

METALLIC FILMS;

EID: 0032118304     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1013201817300     Document Type: Article

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