FT-IR study of the imidization process of photosensitive polyimide PMDA/ODA

Applied Spectroscopy

Volumn 52, Issue 7, 1998, Pages 985-989

  Li, W S ^a   Shen, Z X ^a   Zheng, J Z ^b   Tang, S H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

Curing reaction process; Fourier transform infrared spectroscopy (FT IR); Imidization degree; Polyimide

Indexed keywords

CROSSLINKING; CURING; OPTICAL FILMS; PHOTOSENSITIVITY; PLASTIC FILMS; POLYIMIDES; REACTION KINETICS; SHRINKAGE; SILICON WAFERS; THERMAL EFFECTS; VACUUM APPLICATIONS;

IMIDIZATION;

FOURIER TRANSFORM INFRARED SPECTROSCOPY;

EID: 0032118231     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/0003702981944625     Document Type: Article

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