Effect of sputtering-cleaning on adhesion of the metallic films to polymer substrates

Materials Chemistry and Physics

Volumn 54, Issue 1-3, 1998, Pages 102-105

  Fujinami, Yasushi ^a   Hayashi, Hiroaki ^a   Ebe, Akinori ^a   Imai, Osamu ^a   Ogata, Kiyoshi ^a  

^a NISSIN ELECTRIC CO LTD   (Japan)

Author keywords

Adhesion; Chemical bonding; Ion irradiation; Polyethylene; Polytetrafluoroethylene; Titanium

Indexed keywords

ADHESION; ARGON; CHEMICAL BONDS; CLEANING; INTERFACES (MATERIALS); ION BOMBARDMENT; POLYETHYLENES; POLYTETRAFLUOROETHYLENES; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ARGON ION IRRADIATION; POLYMER SUBSTRATES;

METALLIC FILMS;

EID: 0032116672     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(98)00094-7     Document Type: Article

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