Surface cleaning, electronic states and electron affinity of diamond (100), (111) and (110) surfaces

Surface Science

Volumn 409, Issue 2, 1998, Pages 320-335

  Baumann, P K ^a,b   Nemanich, R J ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Diamond; Electron emission; Field emission; Photoemission; Semiconductor surfaces; Surface electronic phenomena; Ultraviolet photoelectron spectroscopy

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ELECTROCHEMISTRY; ELECTRON EMISSION; ELECTRONIC DENSITY OF STATES; PHOTOEMISSION; PLASMA ETCHING; SEMICONDUCTING DIAMONDS; SURFACE TREATMENT; ULTRAVIOLET SPECTROSCOPY;

NEGATIVE ELECTRON AFFINITY; SEMICONDUCTOR SURFACES; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;

CLEANING;

EID: 0032115944     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00259-3     Document Type: Article

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