Highly sensitive OBIRCH system for fault localization and defect detection

IEICE Transactions on Information and Systems

Volumn E81-D, Issue 7, 1998, Pages 743-748

  Nikawa, Kiyoshi ^a   Inoue, Shoji ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Al; Failure analysis; Fault localization; High resistivity; Metal line defect detection; Reliability; TiSi; VLSI chip; Yield

Indexed keywords

FAILURE ANALYSIS; INTEGRATED CIRCUIT TESTING; ION BEAMS; MICROPROCESSOR CHIPS; OPTICAL SYSTEMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

METAL LINE DEFECT DETECTION; OPTICAL BEAM INDUCED RESISTANCE CHANGE (OBIRCH) SYSTEMS;

VLSI CIRCUITS;

EID: 0032115509     PISSN: 09168532     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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