The production and properties of TiN-Ni nanostructure films by filtered vacuum arc deposition

Materials Chemistry and Physics

Volumn 54, Issue 1-3, 1998, Pages 317-320

  Irie, M ^a   Ohara, H ^a   Tsujioka, M ^a   Nomura, T ^a  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

Filtered vacuum arc source; Nanostructure films; Titanium nitride

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; HARDNESS; IONS; MAGNETIC FIELDS; MECHANICAL PROPERTIES; MULTILAYERS; NANOSTRUCTURED MATERIALS; NICKEL; THERMODYNAMIC STABILITY; TITANIUM NITRIDE; VACUUM APPLICATIONS;

FILTERED VACUUM ARC DEPOSITION; MULTILAYER STRUCTURE; NANOPARTICLE STRUCTURE; NANOSTRUCTURE FILM;

METALLIC FILMS;

EID: 0032115265     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(98)00111-4     Document Type: Article

References (6)

1. S. Kadlec, J. Musil, J. Vyskocil, Surf. Coat. Technol. 54/55 (1992) 287.
2. P.J. Martin, Surf. Eng. 9 (1) (1993) 51.
3. R.W. Siegel, G.E. Fougere, Mater. Res. Soc. Symp. Proc. 362 (1595) 219.
4. A. Anders, S. Anders, I.G. Brown, M.R. Dickinson, R.A. MacGill, J. Vac. Sci. Technol. B 12 (2) (1994) 815.
5. I.I. Aksenov, S.I. Vakula, V.G. Padalka, V.E. Strel'nitskii, V.M. Khoroshikh, Sov. Phys. Tech. Phys. 25 (9) (1980) 1164.
6. J.A. Vanable, D.G.T. Spiller, M. Handbucken, Rep. Prog. Phys. 47 (1984) 399.