Anomalous temperature dependence of series resistance in Ag/Si and Al/Si Schottky junctions

Vacuum

Volumn 50, Issue 3-4, 1998, Pages 417-419

  Horvath Zs J ^a   Adam M ^a   Pinter I ^a   Cvikl, B ^b,c   Korosak D ^b,c   Mrdjen, T ^b,c   Van Tuyen, Vo ^a   Makaro Zs ^a   Ducso Cs ^a   Barsony I ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b UNIVERSITY OF MARIBOR   (Slovenia)

^c UNIVERSITY OF LJUBLJANA   (Slovenia)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DEPOSITION; ELECTRIC RESISTANCE; ION IMPLANTATION; OHMIC CONTACTS; PLASMAS; SEMICONDUCTING SILICON; SILVER; THERMAL EFFECTS;

SCHOTTKY JUNCTION; SERIES RESISTANCE; TEMPERATURE DEPENDENCE;

SEMICONDUCTOR JUNCTIONS;

EID: 0032108985     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00076-1     Document Type: Article

References (7)

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