Atmospheric downstream plasma - a new tool for semiconductor processing

Solid State Technology

Volumn 41, Issue 7, 1998, Pages 133-136

  Savastiouk, Sergey ^a   Siniaguine, Oleg ^a   Hammond, Martin L ^a  

^a Tru Si Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRODES; QUENCHING; SILICON WAFERS; STRESSES;

ATMOSPHERIC DOWNSTREAM PLASMA (ADP) SYSTEMS; WET ETCHING;

PLASMA ETCHING;

EID: 0032108577     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (0)