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High Performance Polymers

Volumn 10, Issue 2, 1998, Pages 207-215

Investigation of thin films made from silicon-containing polyphenylquinoxaline-amides

(7) Bruma, M a Schulz, B b Kopnick T b Dietel, R b Stiller, B b Mercer, F c Reddy, V N c

a PETRU PONI INSTITUTE OF MACROMOLECULAR CHEMISTRY (Romania)

b Inst Thin Film Technol M (Germany)

c Raychem Corporation (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; COATING TECHNIQUES; CONDENSATION REACTIONS; GLASS; HEAT TREATMENT; PERMITTIVITY; POLYAMIDES; POLYCONDENSATION; SILICON WAFERS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

POLYPHENYLQUINOXALINEAMIDES; SPIN COATING;

PLASTIC FILMS;

EID: 0032099952 PISSN: 09540083 EISSN: None Source Type: Journal
DOI: 10.1088/0954-0083/10/2/005 Document Type: Article

Times cited : (20)

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