Oxidation of spatially controlled atomically flat Si(001) surface

Applied Surface Science

Volumn 130-132, Issue , 1998, Pages 197-201

  Ando, Atsushi ^a   Sakamoto, Kunihiro ^a   Miki, Kazushi ^a   Matsumoto, Kazuhiko ^a   Sakamoto, Tsunenori ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; INTERFACES (MATERIALS); MORPHOLOGY; OXIDATION; OXYGEN; SILICA; SURFACE PHENOMENA; SURFACE ROUGHNESS; THERMAL EFFECTS;

STEP FREE SURFACE;

SEMICONDUCTING SILICON;

EID: 0032099128     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00050-6     Document Type: Article

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