Thin film ferroelectrics for capacitor applications

Journal of Materials Science: Materials in Electronics

Volumn 9, Issue 3, 1998, Pages 199-205

  O'Neill, D ^a   Catalan, G ^a   Porras, F ^a   Bowman, R M ^a   Gregg, J M ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; CERAMIC MATERIALS; DEPOSITION; ELECTRIC PROPERTIES; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; PULSED LASER APPLICATIONS; THIN FILM DEVICES; BARIUM TITANATE; CAPACITORS; CRYSTAL STRUCTURE; FILM GROWTH; PHASE TRANSITIONS; PULSED LASER DEPOSITION; SEMICONDUCTING LEAD COMPOUNDS; STOICHIOMETRY; STRONTIUM COMPOUNDS;

BARIUM STRONTIUM TITANATE; PULSED LASER DEPOSITION (PLD); ELECTRICAL CHARACTERIZATION; THIN FILM CAPACITOR;

CAPACITORS; FERROELECTRIC THIN FILMS;

EID: 0032098725     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008826124316     Document Type: Article

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