Characterization of GeO2 sub-monolayers on SiO2 prepared by chemical vapor deposition of Ge(OMe)4 by EXAFS, FT-IR, and XRD

Langmuir

Volumn 14, Issue 13, 1998, Pages 3607-3613

  Okumura, K ^a   Asakura, K ^a   Iwasawa, Y ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CALCINATION; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GERMANIUM COMPOUNDS; HYDROGEN BONDS; SILICA; SURFACE PROPERTIES; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

BRONSTED ACID; EXTENDED X RAY ABSORPTION FINE STRUCTURE (EXAFS) ANALYSIS; GERMANIUM DIOXIDE; LEWIS ACID;

MONOLAYERS;

EID: 0032098633     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la970262n     Document Type: Article

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