Atmospheric downstream plasma

European Semiconductor

Volumn 20, Issue 6, 1998, Pages 31-33

  Savastiouk, Sergey ^a   Siniaguine, Oleg ^a   Hammond, Martin L ^a  

^a Tru Si Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; DRY ETCHING; PLASMA SOURCES; SILICON WAFERS;

ATMOSPHERIC DOWNSTREAM PLASMAS (ADP);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032096786     PISSN: 02656027     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)