Microstructure of titanium oxide films investigated by atomic force microscopy and transmission electron microscopy

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 142, Issue 1-2, 1998, Pages 61-66

  Zhang, Feng ^a   Liu, Xianghuai ^a   Jin, S ^b   Bender, H ^b   Lou, N Z ^c   Wilson, Z H ^c  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b IMEC   (Belgium)

^c CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; INTERFACES (MATERIALS); ION BEAMS; ION BOMBARDMENT; MICROSTRUCTURE; SILICON; SURFACE ROUGHNESS; TIN COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; XENON;

CORUNDUM STRUCTURE; FILM DEPOSITION; ION BEAM ENHANCED DEPOSITION; TITANIUM OXIDE;

THIN FILMS;

EID: 0032093604     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00211-0     Document Type: Article

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