Structural and magnetic properties of ion beam sputtered NiMnSb films

Physica B: Condensed Matter

Volumn 248, Issue 1-4, 1998, Pages 140-145

  Schlomka, J P ^a   Press, W ^a   Fitzsimmons, M R ^b   Lutt M ^b   Grigorov, I ^c  

^a UNIVERSITY OF KIEL   (Germany)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c JOHNS HOPKINS UNIVERSITY   (United States)

Author keywords

Magneto resistance; Thin films; X ray reflectivity

Indexed keywords

COERCIVE FORCE; CRYSTAL STRUCTURE; FERROMAGNETIC MATERIALS; FILM GROWTH; FILM PREPARATION; MAGNETIC MOMENTS; MAGNETIC PROPERTIES; MAGNETIC THIN FILMS; MAGNETIZATION; MAGNETORESISTANCE; NICKEL ALLOYS; SPUTTER DEPOSITION;

ION BEAM SPUTTERING; X RAY REFLECTIVITY; X RAY SCATTERING;

METALLIC FILMS;

EID: 0032092406     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(98)00221-X     Document Type: Article

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