Plasma enhanced chemical vapor deposition of fluorinated amorphous carbon thin films from tetrafluoroethylene and tetraisocyanatesilane

Plasmas and Polymers

Volumn 3, Issue 2, 1998, Pages 115-127

  Shirafuji, Tatsuru ^a   Nakagami, Yuko ^a   Hayashi, Yasuaki ^a   Nishino, Shigehiro ^a  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Fluorocarbon films; Inter layer dielectric; Low dielectric constant; Poly imide; Tetrafluoroethylene; Tetraisocyanatesilane; Thermal stability

Indexed keywords

ADHESION; AMORPHOUS FILMS; CAPACITANCE MEASUREMENT; DIELECTRIC FILMS; FLUOROCARBONS; MIS DEVICES; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYIMIDES; POLYSILANES; POLYTETRAFLUOROETHYLENES; THIN FILMS;

TETRAISOCYANATESILANE;

PLASTIC FILMS;

EID: 0032083950     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:PAPO.0000005942.82289.25     Document Type: Article

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