Improving wafer yields at low k1 with advanced photomask defect detection

Solid State Technology

Volumn 41, Issue 6, 1998, Pages 185-X

  Vacca, Anthony ^a,d   Eynon, Benjamin ^b   Yeomans, Steve ^c  

^a KLA TENCOR CORPORATION   (United States)

^b DuPont Photomasks Inc   (United States)

^c MICRON TECHNOLOGY INC   (United States)

^d KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CRYSTAL DEFECTS; ERROR ANALYSIS; ERROR DETECTION; MASKS;

PHOTOMASKS;

SILICON WAFERS;

EID: 0032083878     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (2)

1. A.K. Wong et al., "Lithographic Effects of Mask Critical Dimension Error," Proceedings of SPIE, Vol. 3334, paper 10 (to be published in 1998).
2. 1 Imaging Characteristics Using a DUV Printing Tool and Binary Masks," in Optical/Laser Microlithography VIII, ed., T. A. Brunner, Proc. of SPIE 2440, p. 270, 1995.