Structural characteristics of rutile films prepared by direct deposition and neon ion beam assisted deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 140, Issue 3-4, 1998, Pages 361-366

  Liu, Duo ^a,b   Zhang, Feng ^b   Zheng, Zhihong ^b   Wang, Dazhi ^a   Liu, Xianghuai ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Ion beam assisted deposition; Titanium dioxide

Indexed keywords

CURRENT DENSITY; DEPOSITION; FILM PREPARATION; ION BEAMS; NEON; RAMAN SPECTROSCOPY; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

ION BEAM ASSISTED DEPOSITION (IBAD); ION CHANNELING EFFECTS; RUTILE FILMS;

ION BOMBARDMENT;

EID: 0032073107     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00133-5     Document Type: Article

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