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Volumn 145, Issue 5, 1998, Pages 1645-1649

Ultraclean Si/Si interface formation by surface preparation and direct bonding in ultrahigh vacuum

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; CONTAMINATION; ELECTRIC CURRENT MEASUREMENT; ELECTRIC RESISTANCE MEASUREMENT; INTERFACES (MATERIALS); SECONDARY ION MASS SPECTROMETRY; SURFACE CLEANING; TEMPERATURE MEASUREMENT; VACUUM APPLICATIONS;

EID: 0032072763     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838530     Document Type: Article
Times cited : (6)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.