Surface Morphology Evolution of Chemical Vapor-Deposited Tungsten Films on Si(100)

Chemical Vapor Deposition

Volumn 4, Issue 3, 1998, Pages 89-91

  Vázquez, Luis ^a   Salvarezza, Roberto C ^b   Albano, Ezequiel ^b   Arvia, Alejandro J ^b   Hernández Creus, Alberto ^c   Levy, Roland A ^d   Albella, José M ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUTO DE INVESTIGACIONES FISICOQUÍMICAS TEÓRICAS Y APLICADAS INIFTA   (Argentina)

^c UNIVERSIDAD DE LA LAGUNA   (Spain)

^d NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE ROUGHNESS; TUNGSTEN;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION;

METALLIC FILMS;

EID: 0032072677     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-3862(199805)04:03<89::AID-CVDE89>3.0.CO;2-9     Document Type: Article

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