Growth of perovskite manganite oxide thin films by PLD

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 410-417

  Boyd, Ian W ^a   Zhang, Wei ^a,b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Fe doping; Perovskite; Trivalent ions

Indexed keywords

COMPOSITION EFFECTS; DEPOSITION; ELECTRIC PROPERTIES; FILM GROWTH; IRON; MAGNETORESISTANCE; PULSED LASER APPLICATIONS; SEMICONDUCTOR DOPING;

ELECTRON HOPPING; JAHN TELLER DISTORTION; PEROVSKITE MANGANITE OXIDE; PULSED LASER DEPOSITION; TRIVALENT IONS;

PEROVSKITE;

EID: 0032070599     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00665-X     Document Type: Article

References (38)

1. S. Jin, M. McCormack, T.H. Tiefel, R. Ramesh, J. Appl. Phys. 76 (1994) 6929.
2. R. von Helmolt, J. Wecker, K. Samwer, L. Haupt, D. Barner, J. Appl. Phys. 76 (1994) 6925.
3. G.C. Xiong, Q. Li, H.L. Ju, R.L. Greene, T. Venkatesan, Appl. Phys. Lett. 66 (1995) 1689.
4. M.F. Hundley, M. Hawley, R.H. Heffner, Q.X. Jia, J.J. Neumeier, J. Tesmer, J.D. Thompson, X.D. Wu, Appl. Phys. Lett. 67 (1995) 860.
5. R. Mahendiran, S.K. Tiwary, A.K. Raychaudhuri, T.V. Ramrkrishnan, Phys. Rev. B 53 (1996) 3348.
6. H.Y. Hwang, S.-W. Cheong, P.G. Radaelli, M. Marezio, B. Batlogg, Phys. Rev. Lett. 76 (1995) 914.
7. B. Chen, C. Uher, D.T. Morelli, J.V. Mantese, A.M. Mance, A.L. Micheli, Phys. Rev. B 53 (1996) 5094.
8. P. Schiffer, A.P. Ramirez, W. Bao, S. Cheong, Phys. Rev. Lett. 75 (1995) 3336.
9. C. Zener, Phys. Rev. 82 (1951) 403.
10. N.F. Mott, Metal-Insulator Transitions, Barnes, New York, 1974, pp. 86-90.
11. P.W. Anderson, H. Hasegawa, Phys. Rev. 100 (1955) 675.
12. T.H. Jacobs, K.H.J. Buschow, G.F. Zhou, X. Li, F.R. de Boer, J. Magn. Magn. Mater. 116 (1992) 220.
13. H. Sun, J.M.D. Coey, Y. Otani, D.P.F. Hurley, J. Phys.: Condens. Matter 2 (1990) 6465.
14. C. Kittle, Introduction to Solid State Physics, 5th ed., Wiley, New York, 1976.
15. J.F. Mitchell, D.N. Argyriou, C.D. Potter, D.G. Hinks, J.D. Jorgensen, S.D. Badder, Phys. Rev. B 54 (1996) 6172.
16. D.B. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Films, Springer-Verlag, Berlin, 1994.
17. I.W. Boyd, R.B. Jackman, Photochemical Processing of Electronic Materials, Academic Press, London, 1992.
18. P.E. Dyer et al., Appl. Surf. Sci. 54 (1992) 255.
19. D. Misra et al., Physica C 176 (1991) 43.
20. W. Kautek, Thin Solid Films 191 (1990) 317.
21. W. Zhang, I.W. Boyd, M. Elliott, W. Herrenden-Harkerand, Appl. Phys. Lett. 69 (1996) 1154.
22. G.C. Tyrrell, T.H. York, I.W. Boyd, Appl. Surf. Sci. 86 (1995) 50.
23. J.B. Torrance, P. Lacorre, A.I. Nazzal, Phys. Rev. B 45 (1992) 8209.
24. J. Gonzalo, C.N. Afonso, J. Perrière, Appl. Phys. Lett. 67 (1995) 1325.
25. M.C. Foote, B.B. Jones, B.D. Hunt, J.B. Barner, R.P. Vasquez, L.J. Bajuk, Physica C 201 (1992) 176.
26. W. Zhang, I.W. Boyd, M. Elliott, W. Herrenden-Harkerand, Appl. Phys. Lett. 69 (1996) 3526.
27. E. Van de Riet, J.C.S. Kools, J. Dieleman, J. Appl. Phys. 73 (1993) 8290.
28. H.H. Anderson, in: M. Matic (Ed.), Physics of Ionized Gases, SPIG 1980, Boris Kidric Institute of Nuclear Science, Beograd, 1980, p. 421.
29. P.C. Zalm, J. Vac. Sci. Technol. B 2 (1984) 151.
30. E. Van de Riet, J.C.S. Kools, J. Dieleman, J. Appl. Phys. 73 (1993) 8290.
31. C. Kittel, Introduction to Solid State Physics, 5th ed., Wiley, New York, 1976, p. 74.
32. J.F. Lawler, J.G. Lunney, J.M.D. Coey, Appl. Phys. Lett. 65 (1994) 3017.
33. K.-H. Ryu, K.-S. Roh, S.-J. Lee, C.-H. Yo, J. Solid State Chem. 105 (1993) 550.
34. A.J. Millis, P.B. Littlewood, B.I. Shraiman, Phys. Rev. Lett. 74 (1995) 5144.
35. N. Igor Solovyev, K. Terakura, Phys. Rev. Lett. 76 (1996) 4825.
36. J.J. Neumeier, M.F. Hundley, J.D. Thompson, R.H. Heffner, Phys. Rev. B 52 (1995) R7006.
37. B. Fisher, L. Patlagan, G.M. Reisner, Phys. Rev. B 54 (1996) 9359.
38. E.O. Wollan, W.C. Koehler, Phys. Rev. 100 (1955) 545.