Long-phase error-free fiber Bragg gratings

IEEE Photonics Technology Letters

Volumn 10, Issue 5, 1998, Pages 687-689

  Komukai, T ^a,b   Nakazawa, M ^a,b  

^a IEEE   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

Electron beam lithography; Filtering; Masks; Optical device fabrication; Optical fiber device; Wavelength division multiplexing

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ERROR ANALYSIS; FREQUENCY DIVISION MULTIPLEXING; MASKS; OPTICAL COMMUNICATION; OPTICAL FIBER FABRICATION;

FIBER BRAGG GRATINGS (FBG); STITCHING ERROR FREE PHASE MASKS;

DIFFRACTION GRATINGS;

EID: 0032070492     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.669251     Document Type: Article

References (6)

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6. W. H. Loh, M. J. Cole, M. N. Zervas, S. Barcelos, and R. I. Lamming, "Complex grating structures with uniform phase masks based on the moving fiber-scanning beam technique," Opt. Lett., vol. 20, no. 20, pp. 2051-2053, 1995.