Raman spectra of silica gel prepared from triethoxysilane and tetraethoxysilane by the sol-gel method

Journal of the Ceramic Society of Japan

Volumn 106, Issue 5, 1998, Pages 528-530

  Matsui, Kazunori ^a   Satoh, Hisao ^b   Kyoto, Michihisa ^b  

^a KANTO GAKUIN UNIVERSITY   (Japan)

^b SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

Raman spectra; Silica; Sol gel process; Tetraethoxysilane; Triethoxysilane

Indexed keywords

ATOMS; RAMAN SPECTROSCOPY; SILANES; SOL-GELS;

TETRAETHOXYSILANE; TRIETHOXYSILANE;

SILICA GEL;

EID: 0032069655     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.106.528     Document Type: Article

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