Atomic peening effect of ambient gas on platinum films grown on amorphous substrates by pulsed laser deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 5 A, 1998, Pages 2629-2633

  Koo, Tae Yeong ^a   Lee, Ki Bong ^a   Jeong, Yoon Hee ^a   Kang, Kwang Yong ^b  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Atomic peening effect; Oriented platinum films; Pulsed laser deposition

Indexed keywords

DEPOSITION; GASES; HIGH TEMPERATURE EFFECTS; LASER APPLICATIONS; PLATINUM; PRESSURE EFFECTS; SILICA; SUBSTRATES; THIN FILMS;

ATOMIC PEENING EFFECT;

EPITAXIAL GROWTH;

EID: 0032068414     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2629     Document Type: Article

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