Epitaxial Si/SiO2 low dimensional structures

Thin Solid Films

Volumn 321, Issue 1-2, 1998, Pages 234-240

  Ishikawa, Yukari ^a   Shibata, N ^a   Fukatsu, S ^b  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

Low dimensional structures; Molecular beam epitaxy; Si SiO2

Indexed keywords

MOLECULAR BEAM EPITAXY; NANOSTRUCTURED MATERIALS; OPTOELECTRONIC DEVICES; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR QUANTUM DOTS; SEMICONDUCTOR QUANTUM WIRES; SILICA;

BRAGG REFLECTORS; QUANTUM CONFINEMENT STRUCTURES;

HETEROJUNCTIONS;

EID: 0032068272     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00479-9     Document Type: Article

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