|
Volumn 141, Issue 1-4, 1998, Pages 675-678
|
VUV-light-induced deposited silica films
|
Author keywords
Excimer; Silica; Thin films; UV light
|
Indexed keywords
ABLATION;
BOND STRENGTH (CHEMICAL);
DEPOSITION;
ELECTRODES;
ELLIPSOMETRY;
MORPHOLOGY;
POLYIMIDES;
POLYPROPYLENES;
SILICA;
SILICON WAFERS;
ULTRAVIOLET RADIATION;
X RAY PHOTOELECTRON SPECTROSCOPY;
PHOTOABLATION;
DIELECTRIC FILMS;
|
EID: 0032068194
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(98)00063-9 Document Type: Article |
Times cited : (5)
|
References (6)
|