Modification of the optical properties of Ag nanoclusters by sequential implantation of Sc(Ti) and O in silica

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 141, Issue 1-4, 1998, Pages 256-260

  Magruder III, R H ^a   Zuhr, R A ^b  

^a BELMONT UNIVERSITY   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Ion implantation; Optical absorption; Silica

Indexed keywords

ION IMPLANTATION; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; SILVER;

SEQUENTIAL IMPLANTATION; SURFACE PLASMON RESONANCE;

SILICA;

EID: 0032067825     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0168-583x(98)00095-0     Document Type: Article

References (14)

1. C. Flytzanis, F. Hache, M.C. Klein, D. Richard, Ph. Roussignol, Prog. Optics 29 (1991) 321 and references therein.
2. U. Kreibig, L. Genzel, Surf. Sci. 156 (1985) 678.
3. G. Mie, Ann. Phys. 25 (1908) 377.
4. C.F. Bohren, D.R. Huffman, Absorption and Scattering of Light by Small Particles, Wiley, New York, 1983.
5. A.E. Neeves, M.H. Birnboim, J. Opt. Soc. Am. B 6 (1989) 787.
6. M.E. Lines, J. Appl. Phys. 69 (1991) 6876.
7. N.F. Borrelli, B.G. Aitken, M.A. Newhouse, J. Non-Cryst. Solids 185 (1995) 109.
8. Z. Pan, S.H. Morgan, D.O. Henderson, R.H. Magruder III, R.A. Zuhr, Nucl. Instr. and Meth B 114 (1995) 281.
9. T.S. Anderson, R.H. Magruder III, R.A. Zuhr, J.E. Wittig, J. Electronic Materials 25 (1995) 27.
10. R.H. Magruder III., R.A. Zuhr, to be published.
11. R.H. Magruder III., R.A. Weeks, R.A. Zuhr, Materials Research Society Proceedings 157 (1990) 519.
12. R.H. Magruder III, D.H. Osborne Jr., R.A. Zuhr, Nucl, Instr. and Meth. B 99 (1995) 590.
13. C.E. Wicks, F.E. Block, Thermodynamic Properties of 65 Elements, Bulletin 605 Bureau of Mines, United States Printing Office, Washington, 1963.
14. E.J. Friebele, D.L. Griscom, in: M. Tomozawa, R.H. Doremus (Eds.), Radiation Effects in Glass, Treatise on Material Science and Technology, vol. 17, Academic Press, New York, 1979, pp. 257-351.