Damage recovery in ion-implanted TiO2 at low temperatures

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 141, Issue 1-4, 1998, Pages 332-337

  Khubeis, I ^a   Fromknecht, R ^b   Massing, S ^b   Meyer, O ^b  

^a Al Bazga University   (Jordan)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Radiation damage; Recovery; TiO2

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CRYSTAL DEFECTS; CRYSTAL LATTICES; ION IMPLANTATION; LOW TEMPERATURE EFFECTS; RADIATION DAMAGE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS;

RADIATION DAMAGE RECOVERY; RUTHERFORD BACKSCATTERING CHANNELING (RBSC) TECHNIQUE;

TITANIUM DIOXIDE;

EID: 0032067031     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00157-8     Document Type: Article

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