Formation of In-O films by Ar+ ion beam assisted reactive deposition

Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 83-86

  Nakamura, I ^a   Kamiya, M ^a   Takano, I ^a   Sawada, Y ^a   Nakazawa, E ^a  

^a KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Ar+ ion beam; In O films; Reactive deposition

Indexed keywords

ARGON; COMPOSITION; CRYSTAL ORIENTATION; CURRENT DENSITY; DEPOSITION; ELECTRIC CONDUCTIVITY; EVAPORATION; INDIUM COMPOUNDS; ION BEAMS; ION BOMBARDMENT; X RAY CRYSTALLOGRAPHY;

DIFFRACTION PATTERN; ION BEAM ASSISTED REACTIVE DEPOSITION; TRANSMISSIVITY;

FILMS;

EID: 0032066920     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00377-6     Document Type: Article

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