Angular distribution of the sputtered atoms from UO2 under high electronic stopping power irradiation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 141, Issue 1-4, 1998, Pages 372-377

  Bouffard, S ^a   Duraud, J P ^b   Mosbah, M ^b   Schlutig, S ^a  

^a Centre Interdisciplinaire de Recherche Ions Lasers   (France)

^b CEA SACLAY   (France)

Author keywords

Heavy ion irradiation; Sputtering; UO2

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMS; ETCHING; FISSION REACTIONS; ION BOMBARDMENT; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTERING;

HEAVY ION IRRADIATION;

URANIUM DIOXIDE;

EID: 0032064904     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00170-0     Document Type: Article

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