Plasma characterization in chlorine-based reactive ion beam etching and chemically assisted ion beam etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 5 A, 1998, Pages 2747-2751

  Matsutani, Akihiro ^a   Koyama, Fumio ^a   Iga, Kenichi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Appearance mass spectrometry; Chemically assisted ion beam etching; Ion energy; Reactive ion beam etching

Indexed keywords

ARGON; CHLORINE; ION BEAMS; IONS; MASS SPECTROMETRY; PLASMAS;

ION ENERGY;

ETCHING;

EID: 0032064449     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2747     Document Type: Article

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