Soft magnetic properties of ion beam reactively sputtered Fe-N thin films on Ge(100)

Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 156-160

  Ding, X Z ^a   Zhang, F M ^a   Sun, Y L ^a   Zhou, Z Y ^a   Yan, J S ^a   Shen, H L ^a   Wang, X ^a   Liu, X H ^a   Shen, D F ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Iron nitride films; Magnetic properties; Reactive ion beam sputtering

Indexed keywords

ANNEALING; COMPOSITION; ION BEAMS; IRON COMPOUNDS; MAGNETIC PROPERTIES; MAGNETIC VARIABLES MEASUREMENT; MAGNETIZATION; MICROSTRUCTURE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS;

IRON NITRIDE; REACTIVE ION BEAM SPUTTERING; SATURATION MAGNETIZATION;

THIN FILMS;

EID: 0032064314     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00369-7     Document Type: Article

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