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Volumn 38, Issue 5, 1998, Pages 759-765

Transient behavior and low VDS hysteresis in PD SOI MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

HYSTERESIS; IMPACT IONIZATION; PARAMETER ESTIMATION; SILICON ON INSULATOR TECHNOLOGY;

EID: 0032064281     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(98)00025-0     Document Type: Article
Times cited : (2)

References (16)
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    • Hwang, B.Y.1
  • 4
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    • Reduction of kink effect in thin-film SOI MOSFETs
    • Colinge JP. Reduction of kink effect in thin-film SOI MOSFETs. IEEE Electron Device Lett 1988;EDL-9:97.
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    • Colinge, J.P.1
  • 5
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    • Eaton, S.S.1    Lalevic, B.2
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    • Analysis of floating body induced transient behaviors in partially depleted thin film SOI devices
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    • Shin, H.C.1
  • 8
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    • Suppression of drain-current overshoot in SOI MOSFETs using an ultrathin SOI substrate
    • Hazama H et al. Suppression of drain-current overshoot in SOI MOSFETs using an ultrathin SOI substrate. Electronics Letters 1988;24:1266.
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    • Hazama, H.1
  • 9
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    • Deep states in silicon-on-insulator substrates prepared by oxygen implantation using current deep level transient spectroscopy
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  • 10
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    • Transient behavior of subthreshold characteristics of fully depleted SOI MOSFETs
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.