Structure and morphology of Ge(Au) sputtered films with useful Seebeck effect

Vacuum

Volumn 50, Issue 1-2, 1998, Pages 207-210

  Beensh Marchwicka, G ^a   Osadnik, S ^a   Prociow E ^a   Mielcarek, W ^b  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b ELECTROTECHNICAL INSTITUTE   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; ELECTRIC CONDUCTIVITY; GOLD; MAGNETRON SPUTTERING; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; SEEBECK EFFECT; SEMICONDUCTING GERMANIUM; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; TENSILE STRESS;

SEEBECK COEFFICIENT; THERMOELECTRIC PROPERTIES;

THIN FILMS;

EID: 0032058216     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00043-8     Document Type: Article

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