The AES and EELS study of thin alumina films deposited on niobium

Vacuum

Volumn 50, Issue 1-2, 1998, Pages 233-235

  Kapsa, R ^a   Matolin V ^a   Gruzza, B ^b  

^a CHARLES UNIVERSITY   (Czech Republic)

^b UNIVERSITÉ CLERMONT AUVERGNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; DISSOCIATION; ELECTRON ENERGY LOSS SPECTROSCOPY; MOLECULAR ORIENTATION; NIOBIUM; POLYCRYSTALLINE MATERIALS; STOICHIOMETRY; SUBSTRATES;

KNUDSEN CELL; SURFACE ORIENTATION; THIN ALUMINA FILMS;

THIN FILMS;

EID: 0032058109     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00101-8     Document Type: Article

References (6)

1. Fuchs, G., Nieman, D. and Poppa, H., Thin Solid Films, 1992, 65, 207.
2. Chou, T. C. and Nieh, T. G., Thin Solid Films, 1992, 89, 221.
3. Ealet, B., Elyakhloufi, M. H., Gillet, E. and Ricci, M., Thin Solid Films, 1994, 92, 250.
4. Kapsa, R., Stará, I., Zeze, D., Gruzza, B. and Matolín, V., Thin Solid Films, 1997, in press.
5. Tanuma, S., Powell, C. J. and Penn, D. R., Surface and Interface Analysis, 1988, 11, 577.
6. Tougaard, S., Surface Science, 1989, 216, 343.