Phase Reactions and Diffusion Path of the SiC/Cr System

Journal of Materials Synthesis and Processing

Volumn 6, Issue 3, 1998, Pages 169-173

  Naka, M ^a   Feng, J C ^a,b   Schuster, J C ^a,c  

^a OSAKA UNIVERSITY   (Japan)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

^c UNIVERSITY OF VIENNA   (Austria)

Author keywords

Bonding strength; Ceramic metal joining; Chromium carbide; Chromium suicide; Interface structure; Silicon carbide

Indexed keywords

BOND STRENGTH (MATERIALS); BONDING; CHROMIUM; DIFFUSION; INTERFACES (MATERIALS); MICROSTRUCTURE; SILICON CARBIDE; SINTERING; X RAY DIFFRACTION ANALYSIS;

CHROMIUM SILICIDE; SILICON CARBIDE CHROMIUM JOINING;

PHASE TRANSITIONS;

EID: 0032057869     PISSN: 10647562     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1022617502576     Document Type: Article

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