Fused quartz dissolution rate in silicon melts: Influence of boron addition

Journal of Crystal Growth

Volumn 186, Issue 4, 1998, Pages 557-564

  Abe, K ^a   Terashima, K ^a   Matsumoto, T ^a   Maeda, S ^a   Nakanishi, H ^a  

^a SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; DISSOLUTION; FUSED SILICA; REACTION KINETICS; SEMICONDUCTING BORON; SEMICONDUCTING SILICON; SILICON CARBIDE; THERMAL EFFECTS;

CRISTOBALITE;

CRYSTAL GROWTH FROM MELT;

EID: 0032050574     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00618-0     Document Type: Article

References (6)

1. R.E. Chaney, C.J. Varker, J. Crystal Growth 33 (1976) 188.
2. R.E. Chaney, C.J. Varker, J. Electrochem. Soc. 123 (1985) 846.
3. H. Hirata, K. Hoshikawa, Jpn. J Appl. Phys. 19 (1980) 1573.
4. A.R. Bean, R.C. Newman, J. Phys. Chem. Solids 32 (1971) 1211.
5. M.W. Chase, J.L. Curnutt, R.A. McDonald, A.N. Syverud, JANAF Thermochemical Tables, 1978 Supplement, J. Phys. Chem. Ref. Data 7 (1978) 793.
6. K. Abe, T. Matsumoto, S. Maeda, H. Nakanishi, K. Terashima, to be submitted.