In situ gas analysis improves cluster tool contamination control

Semiconductor International

Volumn 21, Issue 4, 1998, Pages 117-118,-120,-122

  Tapp, Frederick L ^a   Conroy, Mark ^a   Wise, Rick L ^a   Frystak, David C ^a  

^a BOC Edwards   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTIC EQUIPMENT; CONTAMINATION; IMPURITIES; PROCESS CONTROL; PURGING;

CONTAMINATION CONTROL; RESIDUAL GAS ANALYZERS (RGA); SINGLE WAFER CLUSTER TOOLS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032050361     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)