Highly selective SiO2 etching using inductively coupled plasma source with a multispiral coil

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. B, 1998, Pages 2343-2348

  Yamanaka, Michinari ^a   Hayashi, Shigenori ^a   Kubota, Masafumi ^a   Nakagawa, Hideo ^b  

^a PANASONIC CORPORATION   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Etching; Inductively coupled plasma; Laser induced fluorescence; Pulse modulation; Radical

Indexed keywords

FLUORESCENCE; LASER APPLICATIONS; PULSE MODULATION; SILICA; THERMAL EFFECTS;

CHAMBER WALL HEATING; INDUCTIVELY COUPLED PLASMAS (ICP); LASER INDUCED FLUORESCENCE (LIF) TECHNIQUES; MULTISPIRAL COILS (MSC);

PLASMA ETCHING;

EID: 0032048438     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.2343     Document Type: Article

References (15)

1. K. Miyata, K. Takahashi, S. Kishimoto, M. Hori and T. Goto: Proc. 16th Symp. on Dry. Process, Tokyo November (1994) p. 193.
2. T. Goto and M. Hori: Jpn. J. Appl. Phys. 35 (1996) 6521.
3. S. Den, T. Kuno, M. Ito, M. Hori, T. Goto, Y. Hayashi and Y. Sakamoto: Jpn. J. Appl. Phys. 35 (1996) 6528.
4. S. Samukawa: Jpn. J. Appl. Phys. 33 (1994) 2133.
5. T. Fukasawa, A. Nakamura, H. Shindo and Y. Horiike: Jpn. J. Appl. Phys. 33 (1994) 2139.
6. H. Sugai, K. Nakamura, Y. Hikosaka and M. Nakamura: J. Vac. Sci. Technol. A 13 (1995) 887.
7. T. Okumura and I. Nakayama: Rev. Sci. Instrum. 66 (1995) 5262.
8. S. Hayashi, H. Nakagawa, M. Yamanaka and M. Kubota: Jpn. J. Appl. Phys. 36 (1997) 4845.
9. J. P. Booth, G. Hancock, N. D. Perry and M. J. Toogood: Appl. Phys. 66 (1989) 5251.
10. K. Tachibana, T. Mukai and H. Harima: Jpn. J. Appl. Phys. 30 (1991) L1208.
11. C. Suzuki, Y. Kawai, K. Sasaki and K. Kadota: Proc. 14th Symp. Plasma Processing (1997) p. 437.
12. M. Haverlag, W. W. Stoffels, E. Stoffels, G. M. W. Kroesen and F. J. de Hoog: J. Vac. Sci. Technol. A 14 (1996) 384.
13. K. Takahashi, M. Hori and T. Goto: J. Vac. Sci. Technol. A 14 (1996) 2004.
14. K. Takahashi, M. Hori and T. Goto: J. Vac. Sci. Technol. A 14 (1996) 2011.
15. S. Ashida, M. R. Shim and M. A. Lieberman: J. Vac. Sci. Technol. A 14 (1996) 391.