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Volumn 11, Issue 4, 1998, Pages 426-432
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Plasmapolymerized hexamethyldisilasane for the passivation of YBa2Cu3O7-x devices
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBON DIOXIDE;
CHEMICAL VAPOR DEPOSITION;
CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY);
HIGH TEMPERATURE SUPERCONDUCTORS;
JOSEPHSON JUNCTION DEVICES;
PASSIVATION;
SILANES;
SILICON COMPOUNDS;
SQUIDS;
THERMAL CYCLING;
THIN FILMS;
YTTRIUM COMPOUNDS;
PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD);
PLASMAPOLYMERIZED HEXAMETHYLDISILASANE;
OXIDE SUPERCONDUCTORS;
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EID: 0032048380
PISSN: 09532048
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-2048/11/4/012 Document Type: Article |
Times cited : (9)
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References (22)
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