Modelling conduction in asymmetrical discontinuous metal thin films

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 178-182

  Morris, J E ^a   Wu, Fan ^a  

^a State University of New York at Binghamton   (United States)

Author keywords

Contact injection; Coulomb gap; Discontinuous film; Electron tunnelling; Electrostatic energy; Island film

Indexed keywords

CHARGE CARRIERS; COMPUTER SIMULATION; ELECTRIC RESISTANCE MEASUREMENT; ELECTRON TUNNELING; METALLIC FILMS; MONTE CARLO METHODS;

CONTACT INJECTION; COULOMB GAP; DISCONTINUOUS FILM; ELECTROSTATIC ENERGY; ISLAND FILM;

THIN FILMS;

EID: 0032048314     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00616-0     Document Type: Article

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